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Leo W.M. Lau's Home Page


Leo W.M. Lau

Leo W.M. Lau
BSc (CUHK); PhD (British Columbia)


Education

  1. PDF, Department of Electrical Engineering, U. British Columbia, 1982-1983
  2. PhD, Department of Chemistry, U. British Columbia, 1978-1982
  3. BSc, Department of Chemistry, Chinese University of Hong Kong, Hong Kong, 1972-1976

Professional Qualifications & Responsibilities

  1. Professional Engineer, Association of Professional Engineers of Ontario, licensed since 1997
  2. Honorary Professor, Department of Chemistry, Tsinghua University, appointed since 2000
  3. Honorary Professor, Department of Applied Physics, Beijing Technical University, since 1996
  4. Honorary Professor, Department Physics, Lanzhou University, since 1996
  5. Honorary Professor, Institute of Semiconductors, Chinese Academy of Sciences, since 1992
  6. Technical Advisor, Chemical Technology, the Hong Kong Critical Components Manufacturing Association, since 2003
  7. Council member, Hong Kong Materials Research Society, since 1997
  8. Council member, Hong Kong Metal Finishing Society, since 1997
  9. Chairman, Advisory Board on Testing Consumer Products, Hong Kong Accreditation Scheme, since 2003

Position

  1. Since Sep. 05, Director, Surface Science Western, UWO; Professor, Departments of Chemistry and Physics, UWO
  2. Aug. 97-Jan. 08, Professor of Materials Science, Dept. of Physics, CUHK
  3. Aug. 03-Aug. 05, Dean, Faculty of Science, CUHK
  4. Aug. 02-Jul. 04, Director, Institute of Science and Technology, CUHK
  5. Aug. 01-Jul. 03, Director, Materials Science & Technology Research Centre, CUHK
  6. Aug. 98-Jul. 05, Director, Advanced Surface & Materials Analysis Centre, CUHK
  7. Aug. 98-Jul. 03, Chairman-Dept. of Physics, Faculty EXCO, CUHK
  8. Jul. 95-Aug. 97, Professor, Dept. of Mechanical & Materials Engineering, UWO
  9. Jul. 93-Jun. 95, Associate Professor, Department of Materials Engineering, UWO
  10. Aug. 86-Jun. 93, Group Leader - electronic materials research, Surface Science Western, UWO
  11. Jan. 85-Aug. 86, Assistant Director, Surface Science Western, UWO

Patent

  1. R.W.M. Kwok and W.M. Lau, "Method for selectively removing hydrogen from molecules", US Patent application, filed in March 2002.
  2. Leo W.M. Lau and Wai Kwong Au, "Decorative hard coating and method for manufacture", US Patent application, filed in October 2001.
  3. Biwu Sun and Leo W.M. Lau, "Method for Nucleation and Deposition of Diamond using Hot-filament DC plasma", US Patent 6200652, isued on March 13, 2001; licensed in 1998.
  4. Biwu Sun and Leo W.M. Lau, "Apparatus and Method for Nucleation and Deposition of Diamond using Hot-filament DC plasma", US Patent 6161499, filed on July 7, 1997; issued on December 19, 2000; licensed in 1998.

Research Interests

  1. Scanning tunneling microscopy
  2. Experimental and theoretical studies of surface reactions
  3. Self-assembled monolayers
  4. Microfluidics

Recent Representative Publications

  1. Z. Zheng, W.M. Kwok and W.M. Lau
    "A new cross-linking route via the unusual collision kinematics of hyperthermal protons in unsaturated hydrocarbons: the case of poly(trans-isoprene)", Chemical Communications 29, pp.3122-3124 (2006).

  2. L. Xi, L.Y. Ma, K. He, Z.T. Wang, Q.K. Xue, X.D. Xiao and W.M. Lau
    "Study of Fe deposition onto √3x√3 - Al/ Si (111) template by scanning tunneling microscopy", Surface Science 600(15), pp.3072-3078 (2006).

  3. R.F. Dou, X.C. Ma, L. Xi, H.L. Yip, K.Y. Wong, W.M. Lau, J.F. Jia, Q.K. Xue, W.S. Yang, H. Ma and A.K.Y. Jen
    "Self-assembled monolayers of aromatic thiols stabilized by parallel-displaced π-π stacking interactions", Langmuir 22(7), pp.3049-3056 (2006).

  4. X.L. Fan, Y.F. Zhang, W.M. Lau and Z.F. Liu
    "Adsorption of triplet O2 on Si(100): the crucial step in the initial oxidation of a silicon surface", Physical Review Letters 94(1), 016101 (2005).

  5. Z. Zheng, X.D. Xu, X.L. Fan, W.M. Lau and R.W.M. Kwok
    "Ultrathin polymer film formation by collision-induced cross-linking of adsorbed organic molecules with hyperthermal protons", Journal of the American Chemical Society 126(39), pp.12336-12342 (2004).